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In-situ. DHF supply
Le Chatelier¡¯s Principle
Watermark Free
Variety of Option - Megasonic
- Hot DI
- HTS (Hydrogen Termination System)
- DIO3
Integration available
Stable Etch Uniformity - Minimized Bath
 
Items
NEO-3000 FRD
Remark
Particle @ ¡Â 100nm
  £ªHydrophobic : ¡Â50 adders
  £ªHydrophilic : ¡Â 30 adders
  Initial Bare-wafer Dry
Etching Uniformity
  £ª¡Â5%   30A, 200:1 DHF
  Thermal Oxide Film
IPA Consumption
  £ª< 90ml / 50wfs  
IPA / N2 Temperature
  £ªRoom Temp.  
IPA Generation
  £ªN2 Bubbling   HOT (Option)
HF Mixing
  £ªIn-situ.   Room Temp.
Watermark Haze
  £ªFree  
Total Process Time
  £ªFRD : 290~900¡±   200:1 DHF, 120sec treatment,
  IPA consumption ¡Â 40ml / run
Reliability
  £ªMTBF ¡Ã 1,000hrs
  £ªMTR ¡Ã 2 hrs
  Full Function